Low Temperature Plasma Enhanced CVD Synthesis of Piezoactive ZnO Films
نویسندگان
چکیده
منابع مشابه
Low-pressure CVD and Plasma- Enhanced CVD
LPCVD is a process used in the manufacturing of the deposition of thin films on semiconductors usually ranging from a few nanometers to many micrometers. LPCVD is used to deposit a wide range of possible film compositions with good conformal step coverage. These films include a variety of materials including polysilicon for gate contacts, thick oxides used for isolation, doped oxides for global...
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ژورنال
عنوان ژورنال: Le Journal de Physique IV
سال: 1995
ISSN: 1155-4339
DOI: 10.1051/jphyscol:1995586